AUTOMATION OF NANOPARTICLE SYNTHESIS PROCESSES IN A PLASMA ENVIRONMENT USING LABVIEW

This work presents an automated control system for the synthesis of nanomaterials by plasma-enhanced chemical vapor deposition (PECVD), implemented using the LabVIEW software environment. The main objective of the study is to develop an integrated hardware-software platform that enables sequential control of the key stages of the PECVD process, including vacuum chamber preparation, pressure monitoring, working gas supply, plasma ignition, power matching, cyclic nanomaterial growth, and optical monitoring of nanoparticles in the plasma environment. The use of LabVIEW made it possible to integrate actuator control, experimental parameter acquisition, and realtime process visualization within a single automated system. The automated cycle begins with evacuation of the reaction chamber to a predefined base pressure. Transition to the next stage is permitted only after the specified pressure threshold has been reached, ensuring reproducible initial conditions for each experiment. The program then controls the supply of the working gas through mass flow controllers (MFCs). In this work, two gas-flow control modes were considered: analog control using a 0÷5 V voltage signal and digital communication via RS-232 interface. It was shown that the analog approach requires accurate scaling of the control voltage, since applying 5 V corresponds to full-scale opening of the controller and results in the maximum gas flow. In contrast, the RS232 interface enables the gas flow rate to be specified directly in sccm, improving the accuracy, flexibility, and convenience of gas-environment control. After pressure stabilization, LabVIEW initiates RF plasma ignition and executes the RF matching algorithm aimed at minimizing reflected power and improving the stability of the plasma process. A separate software module implements the cyclic nanomaterial growth mode, in which the plasma-on time, plasma duration, and total number of synthesis cycles are predefined. This approach makes it possible to control material accumulation on the substrate and to correlate the process parameters with the morphological characteristics of the resulting nanostructures. The final module of the system is designed for optical monitoring of the nanoparticle cloud density in dusty plasma. For this purpose, the change in the intensity of laser radiation passing through the plasma region is recorded using a photodetector and a Keithley 2401 measuring unit connected to LabVIEW via RS-232 interface. The difference between the initial and modified optical signal intensity is used as a diagnostic parameter characterizing the formation and temporal evolution of nanoparticles. The developed system demonstrates that LabVIEW can be effectively applied not only for the automation of individual instruments, but also for the implementation of a complete digital control cycle for PECVD-based nanomaterial synthesis.

1. Martinu, L., and Poitras, D. Plasma deposition of optical films and coatings: A review. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 18, 2619–2645 (2000). https://doi.org/10.1116/1.1314395

2. Ostrikov, K. Colloquium: Reactive plasmas as a versatile nanofabrication tool. Reviews of Modern Physics, 77, 489–511 (2005). https://doi.org/10.1103/RevModPhys.77.489

3. Hundt, M., Sadler, P., Levchenko, I., Wolter, M., Kersten, H., and Ostrikov, K. Real-time monitoring of nucleation-growth cycle of carbon nanoparticles in acetylene plasmas. Journal of Applied Physics, 109 (2011). https://doi.org/10.1063/1.3599893

4. Orazbayev, S., Yerlanuly, Y., Utegenov, A., Moldabekov, Z., Gabdullin, M., and Ramazanov, T. Plasma with carbon nanoparticles: advances and application. Nanotechnology, 32, 455602 (2021). https://doi.org/10.1088/1361-6528/ac1a40

5. Orazbayev, S.A., Utegenov, A.U., Zhunisbekov, A.T., Slamyiya, M., Dosbolayev, M.K., and Ramazanov, T.S. Synthesis of carbon and copper nanoparticles in radio frequency plasma with additional electrostatic field. Contributions to Plasma Physics, 58, 961–966 (2018). https://doi.org/10.1002/ctpp.201700146

6. Yerlanuly, Y. Effect of Nitrogen Concentration on Titanium Nitride Thin Film Formation. International Journal of Mathematics and Physics, 14 (2023). https://doi.org/10.26577/ijmph.2023.v14.i2.06

7. Ceiler, M.F., Kohl, P.A., and Bidstrup, S.A. Plasma-Enhanced Chemical Vapor Deposition of Silicon Dioxide Deposited at Low Temperatures. Journal of The Electrochemical Society, 142, 2067–2071 (1995). https://doi.org/10.1149/1.2044242

8. Zhumadilov, R.Ye., Yerlanuly, Y., Kondo, H., Nemkayeva, R.R., Ramazanov, T.S., Hori, M., and Gabdullin, M.T. Hydrogen peroxide sensing with nitrogen-doped carbon nanowalls. Sensors and Biosensing Research, 43, 100614 (2024). https://doi.org/10.1016/j.sbsr.2023.100614

9. Yerlanuly, Y., Christy, D., Van Nong, N., Kondo, H., Alpysbayeva, B.Ye., Zhumadilov, R., Nemkayeva, R.R., Ramazanov, T.S., Hori, M., and Gabdullin, M.T. Creation of unique shapes by coordination of alumina nanopores and carbon nanowalls. Fullerenes, Nanotubes and Carbon Nanostructures, 31, 295–301 (2023). https://doi.org/10.1080/1536383X.2022.2146672

10. Gabriel, O., Kirner, S., Klick, M., Stannowski, B., and Schlatmann, R. Plasma monitoring and PECVD process control in thin film silicon-based solar cell manufacturing. EPJ Photovoltaics, 5, 55202 (2014). https://doi.org/10.1051/epjpv/2013028

11. Hsieh, Y.-L., Kau, L.-H., Huang, H.-J., Lee, C.-C., Fuh, Y.-K., and Li, T.T. In situ plasma monitoring of PECVD nc-Si:H films and the influence of dilution ratio on structural evolution. Coatings, 8, 238 (2018). https://doi.org/10.3390/coatings8070238

12. Ongaibergenov, Z., Orazbayev, S., Gabdullin, M., Ramazanov, T., Abdrakhmanov, A., Yerlanuly, Y., and Utegenov, A. Diagnostics and characterization of nanoparticles in dusty glow discharge plasma. Scientific Reports, 15, 37530 (2025). https://doi.org/10.1038/s41598-025-22182-0

13. Descoeudres, A., Barraud, L., Bartlome, R., Choong, G., De Wolf, S., Zicarelli, F., and Ballif, C. The silane depletion fraction as an indicator for the amorphous/crystalline silicon interface passivation quality. Applied Physics Letters, 97 (2010). https://doi.org/10.1063/1.3511737

14. Dingemans, G., van de Sanden, M.C.M., and Kessels, W.M.M. Plasma-enhanced Chemical Vapor Deposition of Aluminum Oxide Using Ultrashort Precursor Injection Pulses. Plasma Processes and Polymers, 9, 761–771 (2012). https://doi.org/10.1002/ppap.201100196

15. Kyrykbay, B., Abdirakhmanov, A., Ussenkhan, S., Utegenov, A., Yerlanuly, Y., Ramazanov, T., Koshtybayev, T., and Orazbayev, S. Obtaining hydrophobic coatings from AR+HMDSO using radiofrequency discharge at atmospheric pressure. International Journal of Mathematics and Physics, 15, 77–82 (2024). https://doi.org/10.26577/ijmph.2024v15i1a9

16. Ballesteros, J., Fernández Palop, J.I., Hernández, M.A., and Morales Crespo, R. LabView virtual instrument for automatic plasma diagnostic. Review of Scientific Instruments, 75, 90–93 (2004). https://doi.org/10.1063/1.1634356

17. Law, V.J., O’Neil, F.T., and Dowling, D.P. Evaluation of the sensitivity of electro-acoustic measurements for process monitoring and control of an atmospheric pressure plasma jet system. Plasma Sources Science and Technology, 20, 035024 (2011). https://doi.org/10.1088/0963-0252/20/3/035024

18. National Instruments. LabVIEW (2021). URL : https://www.ni.com/en/shop/labview.html (accessed: 2021).

19. Pawłat, J., Samoń, R., Stryczewska, H.D., Diatczyk, J., and Giżewski, T. RF-powered atmospheric pressure plasma jet for surface treatment. The European Physical Journal Applied Physics, 61, 24322 (2013). https://doi.org/10.1051/epjap/2012120428

20. Giannone, L. et al. Data acquisition and real-time signal processing of plasma diagnostics on ASDEX Upgrade using LabVIEW RT. Fusion Engineering and Design, 85, 303–307 (2010). https://doi.org/10.1016/j.fusengdes.2010.03.030

21. Kersten, H., Thieme, G., Fröhlich, M., Bojic, D., Tung, D.H., Quaas, M., Wulff, H., and Hippler, R. Complex (dusty) plasmas: examples for applications. Pure and Applied Chemistry, 77, 415–428 (2005). https://doi.org/10.1351/pac200577020415

22. Lin, J., Hashimoto, K., Togashi, R., Utegenov, A., Hénault, M., Takahashi, K., Boufendi, L., and Ramazanov, T. Transport control of dust particles by pulse-time modulated RF in dusty plasmas. Journal of Applied Physics, 126 (2019). https://doi.org/10.1063/1.5093349

23. Batryshev, D., Utegenov, A., Zhumadilov, R., Akhanova, N., Orazbayev, S., Ussenkhan, S., Lin, J., Takahashi, K., Bastykova, N., Kodanova, S., Gabdullin, M., and Ramazanov, T. Carbon nanoparticles characteristics synthesized in pulsed radiofrequency discharge and their effect on surface hydrophobicity. Contributions to Plasma Physics, 62 (2022). https://doi.org/10.1002/ctpp.202100238

24. Banerjee, I. et al. In situ optical emission spectroscopic investigations during arc plasma synthesis of iron oxide nanoparticles. IEEE Transactions on Plasma Science, 34, 1175–1182 (2006). https://doi.org/10.1109/TPS.2006.878430

25. Dosbolayev, M.K., Utegenov, A.U., and Ramazanov, T.S. Structural properties of buffer and complex plasmas in RF gas discharge-imposed electrostatic field. IEEE Transactions on Plasma Science, 44, 469–472 (2016). https://doi.org/10.1109/TPS.2015.2497267

26. le Febvrier, A., Landälv, L., Liersch, T., Sandmark, D., Sandström, P., and Eklund, P. An upgraded ultra-high vacuum magnetron-sputtering system. Vacuum, 187, 110137 (2021). https://doi.org/10.1016/j.vacuum.2021.110137

27. Yerlanuly, Y. et al. Achieving stable photodiode characteristics under ionizing radiation. Carbon, 215, 118488 (2023). https://doi.org/10.1016/j.carbon.2023.118488

28. Abdirakhmanov, A. The formation of chondrule-like particles in RF discharge plasma. Physical Sciences and Technology, 10 (2023). https://doi.org/10.26577/phst.2023.v10.i2.08

29. Ahn, J.H. et al. Development of a fully automated desktop chemical vapor deposition system for programmable and controlled carbon nanotube growth. Micro and Nano Systems Letters, 7, 11 (2019). https://doi.org/10.1186/s40486-019-0091-8

30. Niketa, A.K. et al. An automated chemical vapor deposition setup for 2D materials. HardwareX, 9, e00165 (2021). https://doi.org/10.1016/j.ohx.2020.e00165

31. Fernandes, M., Vygranenko, Y., Maçarico, A.F., and Vieira, M. Automated PECVD system for fabrication of a-Si:H devices. Procedia Technology, 17, 580–586 (2014). https://doi.org/10.1016/j.protcy.2014.10.194

32. National Instruments. Set Up Communication with Serial Instruments in LabVIEW using NIVISA. URL: https://knowledge.ni.com/KnowledgeArticleDetails?id=kA03q000000x1jtCAA&l (accessed: 19.12.2023).

33. National Instruments. Programming Serial Devices in VISA. URL: https://www.ni.com/docs/en-US/bundle/ni-visa/page/programming-serial-devices-in-visa.html (accessed: 19.03.2026).

34. Podder, J., Rusop, M., and Soga, T. Boron doped amorphous carbon thin films grown by r.f. PECVD under different partial pressure. Diamond and Related Materials, 14, 1799–1804 (2005). https://doi.org/10.1016/j.diamond.2005.07.020

35. Ahn, J.H. et al. Development of a fully automated desktop chemical vapor deposition system for programmable and controlled carbon nanotube growth. Micro and Nano Systems Letters, 7, 11 (2019). https://doi.org/10.1186/s40486-019-0091-8

36. Kau, L.-H. et al. Correlation of impedance matching and optical emission spectroscopy during PECVD of nanocrystalline silicon thin films. Coatings, 9, 305 (2019). https://doi.org/10.3390/coatings9050305

37. Li, D., Li, J., and Chen, D. Real-time measurement device of RF impedance and power for RF negative ion source. Fusion Engineering and Design, 179, 113124 (2022). https://doi.org/10.1016/j.fusengdes.2022.113124

38. Yu, S. et al. Impedance matching design for capacitively coupled plasmas considering coaxial cables. Journal of Physics D: Applied Physics, 57, 475204 (2024). https://doi.org/10.1088/1361-6463/ad7151

39. Orazbayev, S. et al. The method of synthesizing of superhydrophobic surfaces by PECVD. Journal of Physics: Conference Series, 987, 012004 (2018). https://doi.org/10.1088/1742-6596/987/1/012004

40. Ussenkhan, S.S. et al. Fabricating durable and stable superhydrophobic coatings by atmospheric pressure plasma polymerisation. Heliyon, 10, e23844 (2024). https://doi.org/10.1016/j.heliyon.2023.e23844

41. Baro, M. et al. Pulsed PECVD for low-temperature growth of vertically aligned carbon nanotubes. Chemical Vapor Deposition, 20, 161–169 (2014). https://doi.org/10.1002/cvde.201307093

42. Mohan, A., Poulios, I., Schropp, R.E.I., and Rath, J.K. Size control of gas phase grown silicon nanoparticles by varying plasma OFF time in silane pulsed plasma. MRS Proceedings, 1803, mrss15-2133139 (2015). https://doi.org/10.1557/opl.2015.476

43. Lundin, D., Jensen, J., and Pedersen, H. Influence of pulse power amplitude on plasma properties and film deposition in high power pulsed PECVD. Journal of Vacuum Science & Technology A, 32 (2014). https://doi.org/10.1116/1.4867442

44. Park, H.K., Song, W.S., and Hong, S.J. In situ plasma impedance monitoring of the oxide layer PECVD process. Coatings, 13, 559 (2023). https://doi.org/10.3390/coatings13030559

45. Boufendi, L., Jouanny, M.C., Kovacevic, E., Berndt, J., and Mikikian, M. Dusty plasma for nanotechnology. Journal of Physics D: Applied Physics, 44, 174035 (2011). https://doi.org/10.1088/00223727/44/17/174035

46. Ouaras, K., Lombardi, G., and Hassouni, K. Nanoparticles synthesis in microwave plasmas: peculiarities and comprehensive insight. Scientific Reports, 14, 4653 (2024). https://doi.org/10.1038/s41598023-49818-3

47. Ussenov, Y.A. et al. Langmuir probe measurements in nanodust containing argon-acetylene plasmas. Vacuum, 166, 15–25 (2019). https://doi.org/10.1016/j.vacuum.2019.04.051