kaz29Вестник Казахстанско-Британского технического университетаHerald of the Kazakh-British Technical University1998-66882959-8109Казахстанско-Британский Технический Университет10.55452/1998-6688-2026-23-2-365-380kaz29-2919Research ArticleФИЗИЧЕСКИЕ НАУКИPHYSICAL SCIENCESАВТОМАТИЧЕСКОЕ УПРАВЛЕНИЕ СИНТЕЗОМ НАНОЧАСТИЦ В ПЛАЗМЕННОЙ СРЕДЕ С ИСПОЛЬЗОВАНИЕМ LABVIEWAUTOMATION OF NANOPARTICLE SYNTHESIS PROCESSES IN A PLASMA ENVIRONMENT USING LABVIEWhttps://orcid.org/0000-0001-6768-0918УтегеновА. У.UtegenovA. U.

PhD.

Алматы

PhD.

Almaty

almasbek@physics.kzhttps://orcid.org/0009-0009-6597-2066УсенханС. С.UssenkhanS. S.

Алматы

Almaty

sultanusenhan@gmail.comhttps://orcid.org/0000-0001-7903-8674УсеновЕ. А.UssenovYe. A.

Нью-Джерси, Принстон

NJ, Princeton

yerbolat@physics.kzhttps://orcid.org/0000-0002-7286-9990ОразбаевС. А.OrazbayevS. A.

PhD.

Алматы

PhD.

Almaty

yerbolat@physics.kzИнститут прикладных наук и информационных технологий; Казахский национальный университет им. аль-ФарабиКазахстанInstitute of Applied Sciences and Information Technologies; Al-Farabi Kazakh National UniversityKazakhstanПринстонская лаборатория физики плазмыСоединённые Штаты АмерикиPrinceton Plasma Physics LaboratoryUnited States202627062026232365380Copyright © Утегенов А.У., Усенхан С.С., Усенов Е.А., Оразбаев С.А., 20262026Утегенов А.У., Усенхан С.С., Усенов Е.А., Оразбаев С.А.Utegenov A.U., Ussenkhan S.S., Ussenov Y.A., Orazbayev S.A.Данная работа распространяется под лицензией Creative Commons Attribution 4.0.This work is licensed under a Creative Commons Attribution 4.0 License.https://vestnik.kbtu.edu.kz/jour/article/view/2919

В работе представлена система автоматического контроля процесса синтеза наноматериалов методом плазменно-усиленного химического осаждения из газовой фазы, реализованная на основе программной среды LabVIEW. Основная цель исследования заключается в разработке единой программно-аппаратной платформы, обеспечивающей последовательное управление ключевыми стадиями PECVD-процесса: подготовкой вакуумной камеры, контролем давления, подачей рабочего газа, зажиганием ВЧ-плазмы, согласованием ВЧ-мощности, циклическим ростом наноматериалов и оптическим мониторингом наночастиц в плазменной среде. Использование LabVIEW позволило объединить управление исполнительными устройствами, регистрацию экспериментальных параметров и визуализацию процесса в режиме реального времени. Автоматизированный цикл начинается с откачки реакционной камеры до заданного базового давления. Переход к следующей стадии осуществляется только после достижения установленного порогового значения, что обеспечивает воспроизводимые начальные условия эксперимента. Далее программа управляет подачей рабочего газа через газовый расходомер. В работе рассмотрены два режима управления газовым потоком: аналоговый режим с подачей напряжения 0–5 В и цифровой режим связи через RS-232. Показано, что аналоговый способ требует точного масштабирования управляющего напряжения, поскольку подача 5 В приводит к полному открытию контроллера на максимальный расход. В то же время RS-232-интерфейс позволяет задавать расход непосредственно в единицах sccm, что повышает точность и удобство управления газовой средой. После стабилизации давления LabVIEW инициирует запуск ВЧ-разряда и выполняет алгоритм RF matching, направленный на минимизацию отраженной мощности и повышение стабильности плазменного процесса. Отдельный модуль программы реализует циклический режим роста наноматериалов, где задаются время горения плазмы, время паузы и количество циклов синтеза. Такой подход позволяет контролировать накопление материала на подложке и связывать параметры процесса с морфологическими характеристиками получаемых наноструктур. Завершающий модуль системы предназначен для оптического мониторинга плотности облака наночастиц в пылевой плазме. Для этого используется регистрация изменения интенсивности лазерного излучения, прошедшего через область плазмы, с помощью фотодетектора и измерительного блока Keithley 2401, связанного с LabVIEW через RS-232. Разница между исходной и измененной интенсивностью сигнала используется как диагностический параметр формирования и эволюции наночастиц. Разработанная система демонстрирует, что LabVIEW может эффективно применяться не только для автоматизации отдельных приборов, но и для построения полного цифрового цикла управления PECVD-синтезом наноматериалов.

This work presents an automated control system for the synthesis of nanomaterials by plasma-enhanced chemical vapor deposition (PECVD), implemented using the LabVIEW software environment. The main objective of the study is to develop an integrated hardware-software platform that enables sequential control of the key stages of the PECVD process, including vacuum chamber preparation, pressure monitoring, working gas supply, plasma ignition, power matching, cyclic nanomaterial growth, and optical monitoring of nanoparticles in the plasma environment. The use of LabVIEW made it possible to integrate actuator control, experimental parameter acquisition, and realtime process visualization within a single automated system. The automated cycle begins with evacuation of the reaction chamber to a predefined base pressure. Transition to the next stage is permitted only after the specified pressure threshold has been reached, ensuring reproducible initial conditions for each experiment. The program then controls the supply of the working gas through mass flow controllers (MFCs). In this work, two gas-flow control modes were considered: analog control using a 0÷5 V voltage signal and digital communication via RS-232 interface. It was shown that the analog approach requires accurate scaling of the control voltage, since applying 5 V corresponds to full-scale opening of the controller and results in the maximum gas flow. In contrast, the RS232 interface enables the gas flow rate to be specified directly in sccm, improving the accuracy, flexibility, and convenience of gas-environment control. After pressure stabilization, LabVIEW initiates RF plasma ignition and executes the RF matching algorithm aimed at minimizing reflected power and improving the stability of the plasma process. A separate software module implements the cyclic nanomaterial growth mode, in which the plasma-on time, plasma duration, and total number of synthesis cycles are predefined. This approach makes it possible to control material accumulation on the substrate and to correlate the process parameters with the morphological characteristics of the resulting nanostructures. The final module of the system is designed for optical monitoring of the nanoparticle cloud density in dusty plasma. For this purpose, the change in the intensity of laser radiation passing through the plasma region is recorded using a photodetector and a Keithley 2401 measuring unit connected to LabVIEW via RS-232 interface. The difference between the initial and modified optical signal intensity is used as a diagnostic parameter characterizing the formation and temporal evolution of nanoparticles. The developed system demonstrates that LabVIEW can be effectively applied not only for the automation of individual instruments, but also for the implementation of a complete digital control cycle for PECVD-based nanomaterial synthesis.

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The authors declare that there are no conflicts of interest present.