ETCHING THE SURFACE OF ALUMINUM FOIL USING HIGH-FREQUENCY PLASMA TO PRODUCE A NANOPOROUS ALUMINUM OXIDE MEMBRANE

This work is based on processing the surface of aluminum foil with a purity of 99.999% in a high-frequency plasma discharge using the established parameters, forming an ordered membrane of nanoporous aluminum oxide using an electrochemical anodizing process on the surface of this treated aluminum foil, and determining how much the results obtained in the study depend on the parameters of the experiment. As the main parameter, the value of the power of the high-frequency discharge was used. The surface of pure aluminum foil in the same 50 micron thickness is treated with three different power values. In the course of the study, it was noted that surface roughness depends on different power values of 20 W, 50 W and 70 W. In accordance with the first part of the experiment, the surface of pure aluminum foil is treated with plasma in a high-frequency discharge, as a result of which changes were detected during the research. As a result of the study, it was found that the plasma treatment of the surface of aluminum foil formed tracks that were installed using a scanning electron microscope and determined their features. It was found that these changes depend on the amount of power of the high-frequency discharge during plasma processing. The surface of aluminum foil treated with plasma and nanoporous aluminum oxide membranes formed after electrochemical anodizing were studied using a scanning electron microscope, and it became known that the power value affects the location of tracks and how densely or remotely the porous structures formed after the electrochemical anodizing process are formed. In General, this work is based on processing the surface of aluminum foil using high-frequency plasma to produce an aluminum oxide membrane.

1. Keller F., Hunter H., Robinson D.//J. Electrochem. Soc.1953.V. 100. № 9. P. 411.

2. Hunter M.S., Fowle H. // J. Electrochem. Soc. 1954.V. 101. № 9. P. 481.

3. Томашов Н. Д., Заливалов Ф.П. Сб. Коррозия металлов и сплавов – М.: Металлургиздат, 1963. – С. 194.

4. Томашов Н.Д., Заливалов Ф.П. Сб. Коррозия металлов и сплавов. – М.: Металлургиздат, 1963. – С. 194.

5. Кауль А.Р. Химические методы синтеза неорганических веществ и материалов. Ч.2. М.: Московский государственный университет им. Ломоносова М.В., – 2008. – 212 с.

6. Oehrlein G.S., Metzler D., C. Li, Atomic layer etching at the tipping point: an overview, ECS J. Solid State SC 4 (2015) N5042–N5053.

7. Doering R., Nishi Y., Handbook of Semiconductor Manufacturing Technology, CRC Press, New York, 2008, p. 21.

8. Гусев А.И. Наноматериалы, наноструктуры, нанотехнологии. – М.: Физматлит, 2007. – 416 с.

9. Technology of Integrated Circuits, 2000 “5. Etching Technology” pages 169-206

10. Батаронов И.Л., Гусев А.П., Литвинов Ю.В., Харченко Е.Л., Шалимов Ю.Н. // Альтернативная энергетика и экология. – 2007. – № 11. – С. 118-126.

11. Сурганов В. Ф. // Защита металлов. – 1991. – Т. 27. – № 1. – С. 125-126.

12. Kim D.M., Kim K.B., Yoon S.Y., Oh Y.S., Kim H.T., Lee S.M., Effects of artificial pores and purity on the erosion behaviors of polycrystalline Al2O3 ceramics under fluorine plasma, J. Ceram. Soc. Jpn. 117 (2009) 863–867.

13. Mardilovich P. P., Govyadinov A. N., Mukhurov N. I., Rzhevskii A. M., Paterson R. // J. Membrane Sci. 1995. V. 98. P. 131—142.

14. Bahats’kyy V.O., Vojtovych I.D., Lebyedyeva T. S., Minov Yu. D., Sutkovyy P. H., Frolov Yu. O., Shpyl’ovyy P. B., Ukraine Patent 100934 Bulletin, No. 3: (2013) (in Ukrainian).

15. Степанова А.Ю., Запороцкова И.В., Белов А.Н.// Нанопористые материалы на основе оксида алюминия: механизм образования и технология получения// Вестник ВолГУ. Серия 10. – Вып. 5. – 2011.